| Supervisor’s Foreword | 7 |
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| Abstract | 9 |
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| Acknowledgements | 11 |
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| Contents | 13 |
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| Abbreviations | 16 |
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| 1 Introduction | 18 |
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| References | 22 |
| 2 Fundamentals | 24 |
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| 2.1 Organic Semiconductors: --Conjugated Molecules | 24 |
| 2.2 Electronic Structure Theory | 27 |
| 2.2.1 Nearly Free Electrons | 28 |
| 2.2.2 Model of Tight Binding/LCAO | 29 |
| 2.2.3 The Density of States | 33 |
| 2.2.4 Gap States | 34 |
| 2.3 Models and Processes of Energy--Level Alignment | 38 |
| 2.3.1 Doping and Fermi--Level | 39 |
| 2.3.2 Band Bending | 41 |
| 2.3.3 Vacuum Level Alignment | 49 |
| 2.3.4 Fermi--Level Pinning | 51 |
| 2.3.5 Push Back | 54 |
| 2.3.6 Molecular Film Structure | 56 |
| References | 58 |
| 3 Theory of Experimental Methods | 63 |
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| 3.1 Photoelectron Spectroscopy (PES) | 63 |
| 3.1.1 The Three Step Model of Photoemission | 66 |
| 3.1.2 Interpretation and Analysis of Photoemission Data | 74 |
| 3.2 Near Edge X-ray Absorption Fine Structure (NEXAFS) | 79 |
| 3.2.1 Angular Dependence of Molecular NEXAFS Resonances | 81 |
| 3.3 Scanning Tunneling Microscopy (STM) | 85 |
| 3.4 Low Energy Electron Diffraction (LEED) | 87 |
| References | 89 |
| 4 Methodology and Experimental Setups | 93 |
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| 4.1 Materials and Sample Preparation | 93 |
| 4.1.1 ZnO Crystals | 93 |
| 4.1.2 Organic Materials | 95 |
| 4.2 Experimental Equipment and Settings | 98 |
| 4.2.1 PES, NEXAFS and LEED at BESSY II | 98 |
| 4.2.2 PES, STM/AFM and LEED Setup at the HU Berlin | 100 |
| 4.2.3 PES and LEED at Chiba University | 101 |
| 4.2.4 Optical Characterization of HIOS Structures | 101 |
| 4.3 Data Analysis | 102 |
| 4.3.1 Processing Photoemission Data | 102 |
| 4.3.2 Processing NEXAFS Data | 103 |
| 4.3.3 Processing AFM/STM Data | 104 |
| 4.3.4 PES Peak Fitting and Determination of Positions | 105 |
| References | 105 |
| 5 Results and Discussion | 107 |
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| 5.1 Characterization of the ZnO Faces | 108 |
| 5.1.1 Investigation of the Surface Structure | 109 |
| 5.1.2 Electronic Characterization of the Clean ZnO Faces | 116 |
| 5.2 Donor and Acceptor Molecules on ZnO | 119 |
| 5.2.1 Strong Work Function Increases of ZnO Using F4TCNQ | 120 |
| 5.2.2 F6TCNNQ: A Similar, but Not as Volatile, Acceptor as F4TCNQ | 131 |
| 5.2.3 HATCN, an Application Relevant Acceptor for Tuning the Work Function of ZnO | 135 |
| 5.2.4 A Weak Acceptor, Pentacenetetrone, on ZnO | 143 |
| 5.2.5 Donors on ZnO | 149 |
| 5.3 ZnO Gap State Density of States Limits Adsorption Induced Internal Band Bending | 155 |
| 5.4 Universal Energy-Level Alignment of Para-Sexiphenyl on ZnO | 162 |
| 5.5 Adjusting HIOS Energy-Level Alignment | 168 |
| 5.5.1 Energy-Level Adjustment of 6P on ZnO by HATCN Monolayers | 169 |
| 5.5.2 Demonstration of Continuous Energy-Level Adjustment: SP6 on ZnO(0001) | 173 |
| 5.5.3 Efficient Light Emission from Inorganic and Organic Semiconductor Hybrid Structures by Energy-Level Tuning | 176 |
| References | 186 |
| 6 Conclusion | 197 |
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| Appendix A Mathematica Code for Band Bending in Depletion Approximation | 201 |
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| Appendix B Main Excitation Lines/Satellites | 204 |
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| Appendix C Program Code for Satellite Removal | 205 |
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| Appendix D NEXAFS ``Dark Current''/Offset Related Artifact | 208 |
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| Appendix E Mathematica Code for Band Bending Using Fermi--Dirac Statistics | 211 |
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| Appendix F Additional Experimental Spectra | 215 |
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| F.1 Work Functions of Differently Prepared ZnO | 215 |
| F.2 STM of Ex Situ Hot Furnace Annealed ZnO | 216 |
| F.3 XP Spectra of NMA on ZnO(000bar1) | 216 |
| F.4 Relationship Between GDOS and ZnO Energy--Level Shifts / UV Irradiation | 218 |
| F.5 Thick--Film NEXAFS of 6P on ZnO | 219 |
| Curriculum Vitae | 221 |